Titanium tungsten sputtering targets are a versatile material employed in numerous industrial processes. Their exceptional properties, including high hardness, wear resistance, and low coefficient of friction, make them ideal for applications requiring durable and robust coatings. These targets efficiently deposit thin films through physical vapor … Read More


Gold sputtering targets are essential components in various thin-film deposition processes. These targets, typically crafted from high-purity gold, are utilized to deposit a thin layer of gold onto substrates in a controlled manner. The process involves bombarding the target with ions, causing atoms to be ejected and deposited onto the substrate. T… Read More